Backside illumination image sensor, manufacturing method thereof and image-capturing device

ABSTRACT

An image sensor includes a first photoelectric conversion unit that converts light incident through a first opening to an electric charge, a second photoelectric conversion unit that converts light incident through a second opening which is smaller than the first opening to an electric charge, and a signal output wiring that outputs a first signal generated by the electric charge converted by the first photoelectric conversion unit and a second signal generated by the electric charge converted by the second photoelectric conversion unit. The second photoelectric conversion unit is disposed between the second opening and the signal output wiring.

INCORPORATION BY REFERENCE

This is a continuation of U.S. patent application Ser. No. 17/150,284filed Jan. 15, 2021, which is a continuation of U.S. patent applicationSer. No. 16/249,409 filed Jan. 16, 2019, which is a continuation of U.S.patent application Ser. No. 15/861,917 filed Jan. 4, 2018, which is acontinuation of U.S. patent application Ser. No. 15/439,103 filed Feb.22, 2017, which in turn is a continuation of U.S. patent applicationSer. No. 14/989,205 filed Jan. 6, 2016 (now U.S. Pat. No. 9,609,248),which in turn is a continuation of U.S. patent application Ser. No.14/690,886 filed Apr. 20, 2015 (now U.S. Pat. No. 9,258,500), which inturn is a continuation of U.S. patent application Ser. No. 14/135,144filed Dec. 19, 2013 (now U.S. Pat. No. 9,036,074), which is acontinuation of U.S. patent application Ser. No. 12/702,456 filed Feb.9, 2010 (now U.S. Pat. No. 8,638,381). The disclosure of each of theprior U.S. applications is incorporated herein by reference in itsentirety. The disclosures of the following priority applications areherein incorporated by reference in their entireties: Japanese PatentApplication No. 2009-034106 filed Feb. 17, 2009; and Japanese PatentApplication No. 2009-034107 filed Feb. 17, 2009.

BACKGROUND OF THE INVENTION 1. Field of the Invention

The present invention relates to a backside illumination image sensor, amanufacturing method thereof and an image-capturing device equipped withthe image sensor.

2. Description of Related Art

The image sensors known in the related art include front-sideillumination image sensors that have both focus detection pixels andimage-capturing pixels (see, for instance, Japanese Laid Open PatentPublication No. 2000-305010).

SUMMARY OF THE INVENTION

Since the front-side illumination image sensor in the related art, suchas that disclosed in Japanese Laid Open Patent Publication No.2000-305010 necessitates that a wiring through which a signal from aphotoelectric conversion unit is read out, a color filter and a lightshielding layer be formed between a micro lens and a light receivingunit, the distance (depth) from the micro lens to the light receivingunit, measured at the front-side illumination image sensor is bound tobe large. This gives rise a problem that as the pixels at the imagesensor are further miniaturized, the focus detection accuracy is likelyto be adversely affected.

In addition, at the front-side illumination image sensor in the relatedart disclosed in Japanese Laid Open Patent Publication No. 2000-305010,the wiring through which the signal from the photoelectric conversionunit is read out must be formed on the light entry side of the lightreceiving unit, which necessitates that the light receiving opening beformed at a position set apart from the wiring and for this reason, theopening through which light enters the light receiving unit tends to benarrow. This leads to another problem in that it becomes increasinglydifficult to install focus detection pixels at an image sensor withminiaturized pixels, which adopts a structure that includes focusdetection pixels with even smaller light receiving openings (a pair ofsuch light receiving openings equivalent in size to the light-receivingopening at a standard image-capturing pixel) compared to the lightreceiving openings at image-capturing pixels.

According to the 1st aspect of the present invention, a backsideillumination image sensor equipped with a plurality of pixels disposedin a two-dimensional pattern, comprises: image-capturing pixels; andfocus detection pixels.

According to the 2nd aspect of the present invention, in the backsideillumination image sensor according to the 1st aspect, it is preferredthat: the image-capturing pixels and the focus detection pixels eachinclude a semiconductor layer with a photoelectric conversion unitformed at one surface thereof and another surface thereof used as alight receiving surface, and a wiring layer with a wiring via which asignal from the photoelectric conversion unit is read out; the wiringlayer at the image-capturing pixels and the wiring layer at the focusdetection pixels are each formed on a side where the one surface of thesemiconductor layer is present; the image-capturing pixels each includea color filter, through which light in a predetermined wavelength rangeis transmitted, formed on a side where the other surface of thesemiconductor layer is present; and the focus detection pixels eachinclude a light shielding film that blocks part of light to enter theother surface of the semiconductor layer, formed at a layercorresponding to the color filter at each of the image-capturing pixels.

According to the 3rd aspect of the present invention, in the backsideillumination image sensor according to the 2nd aspect, it is preferredthat the light shielding film assumes a thickness different from athickness of the color filter.

According to the 4th aspect of the present invention, in the backsideillumination image sensor according to the 2nd aspect, it is preferredthat the light shielding film assumes a position offset from a positionof the color filter along a thickness of the backside illumination imagesensor.

According to the 5th aspect of the present invention, in the backsideillumination image sensor according to the 2nd aspect, it is preferredthat the focus detection pixels each further includes a wiring via whicha signal from a photoelectric conversion unit at another pixel is readout instead of the signal from the photoelectric conversion unit at theeach of the focus detection pixels, formed on the side where the onesurface of the semiconductor layer is present.

According to the 6th aspect of the present invention, in the backsideillumination image sensor according to the 2nd aspect, it is preferredthat the wiring overlaps a projected image of a light receiving area ofthe photoelectric conversion unit, projected from a side where the lightreceiving surface of the backside illumination image sensor is present.

According to the 7th aspect of the present invention, an image-capturingdevice comprises a backside illumination image sensor according to the1st aspect.

According to the 8th aspect of the present invention, a backsideillumination image sensor manufacturing method comprises: a P-typeepitaxial layer forming step of forming a P-type epitaxial layer at asurface of a substrate; a photoelectric conversion unit forming step offorming photoelectric conversion units at a surface of the P-typeepitaxial layer; a wiring layer forming step of forming a wiring layerover the photoelectric conversion units; a substrate removing step ofremoving the substrate from the P-type epitaxial layer; a lightshielding film-color filter forming step of forming light shieldingfilms and color filters over a surface of the P-type epitaxial layerfrom which the substrate has been removed; and a micro lens forming stepof forming micro-lenses over the light shielding films and the colorfilters.

According to the 9th aspect of the present invention, in the backsideillumination image sensor according to the 1st aspect, it is preferredthat: the focus detection pixels each include a semiconductor layer witha photoelectric conversion unit formed at one surface thereof andanother surface thereof used as a light receiving surface, a lightshielding film that blocks part of light to enter the other surface anda wiring via which a signal from the photoelectric conversion unit isread out; the wiring is formed on a side where the one surface of thesemiconductor layer is present; and the light shielding film is formedon a side where the other surface of the semiconductor layer is present.

According to the 10th aspect of the present invention, in the backsideillumination image sensor according to the 9th aspect, it is preferredthat the focus detection pixels each further includes a wiring via whicha signal from a photoelectric conversion unit at another pixel is readout instead of the signal from the photoelectric conversion unit at theeach of the focus detection pixels, formed on the side where the onesurface of the semiconductor layer is present.

According to the 11th aspect of the present invention, in the backsideillumination image sensor according to the 9th aspect, it is preferredthat the wiring overlaps a projected image of a light receiving area ofthe photoelectric conversion unit, projected from a side where the lightreceiving surface of the backside illumination image sensor is present.

According to the 12th aspect of the present invention, in the backsideillumination image sensor according to the 9th aspect, it is preferredthat a voltage is applied to the light shielding film.

According to the 13th aspect of the present invention, in the backsideillumination image sensor according to the 9th aspect, it is preferredthat the light shielding film is constituted of a metal assuming areflectance equal to or less than a predetermined level lower than areflectance of aluminum.

According to the 14th aspect of the present invention, in the backsideillumination image sensor according to the 9th aspect, it is preferredthat the light shielding film is constituted of an oxide or a nitridethat assumes a reflectance equal to or less than a predetermined levellower than a reflectance of aluminum and does not allow light to betransmitted through.

According to the 15th aspect of the present invention, in the backsideillumination image sensor according to the 9th or the 10th aspect, it ispreferred that the light shielding film is constituted of a resin thatassumes a reflectance equal to or less than a predetermined level anddoes not allow light to be transmitted through.

According to the 16th aspect of the present invention, in the backsideillumination image sensor according to the 9th aspect, it is preferredthat a film, which is constituted of a metal assuming a reflectanceequal to or less than a predetermined level lower than a reflectance ofaluminum, is formed over a surface of the light shielding film.

According to the 17th aspect of the present invention, in the backsideillumination image sensor according to the 9th aspect, it is preferredthat a film, which is constituted of an oxide or a nitride assuming areflectance equal to or less than a predetermined level lower than areflectance of aluminum and does not allow light to be transmittedthrough, is formed over a surface of the light shielding film.

According to the 18th aspect of the present invention, in the backsideillumination image sensor according to the 9th aspect, it is preferredthat a film, which is constituted of a resin assuming a reflectanceequal to or less than a predetermined level lower than a reflectance ofaluminum and does not allow light to be transmitted through, is formedover a surface of the light shielding film.

According to the 19th aspect of the present invention, in the backsideillumination image sensor according to the 13th aspect, it is preferredthat the predetermined level matches a reflectance of tin.

According to the 20th aspect of the present invention, in the backsideillumination image sensor according to the 1st aspect, it is preferredthat: the focus attention pixels each include a semiconductor layer witha photoelectric conversion unit and a transistor formed at one surfacethereof and another surface thereof used as a light receiving surface, alight shielding film that blocks part of light to enter the othersurface, and at least one wiring among a signal line via which a signalfrom the photoelectric conversion unit is read out, a source line viawhich power to be used to amplify the signal from the photoelectricconversion unit is supplied and a control line via which the transistoris controlled; the wiring is formed on a side where the one surface ofthe semiconductor layer is present; and the light shielding film isformed on a side where the other surface of the semiconductor layer ispresent and assumes at least one function among a function of readingout the signal from the photoelectric conversion unit, a function ofsupplying the power to be used to amplify the signal from thephotoelectric conversion unit and a function of controlling thetransistor.

According to the 21st aspect of the present invention, animage-capturing device comprises a backside illumination image sensoraccording to the 9th aspect.

According to the 22nd aspect of the present invention, a backsideillumination image sensor manufacturing method comprises: a P-typeepitaxial layer forming step of forming a P-type epitaxial layer at asurface of a substrate; a photoelectric conversion unit forming step offorming photoelectric conversion units at a surface of the P-typeepitaxial layer; a wiring layer forming step of forming a wiring layerover the photoelectric conversion units; a substrate removing step ofremoving the substrate from the P-type epitaxial layer; a lightshielding film forming step of forming light shielding films over asurface of the P-type epitaxial layer from which the substrate has beenremoved; a transparent film-color filter forming step of formingtransparent films and color filters over the light shielding films; anda micro lens forming step of forming micro lenses over the transparentfilms and the color filters.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows the structure adopted in the electronic camera achieved ina first embodiment;

FIG. 2 shows focus detection areas assumed on the image-capturing planeset on the predetermined image forming plane of the exchangeable lens inthe first embodiment;

FIG. 3 shows the color filter Bayer array adopted in the firstembodiment;

FIG. 4 shows in detail the image sensor achieved in the firstembodiment;

FIGS. 5A and 5B show the structure adopted for the image-capturingpixels in the first embodiment;

FIGS. 6A and 6B show the structure adopted for the focus detectionpixels in the first embodiment;

FIG. 7 presents a diagram in reference to which the split-pupil focusdetection method adopted in the first embodiment is described;

FIG. 8 shows the basic pixel structure assumed in the image sensor inthe first embodiment;

FIG. 9 illustrates wirings included in each pixel in the firstembodiment;

FIGS. 10A and 10B show the wirings laid out in the wiring layer in thefirst embodiment;

FIGS. 11A through 11C illustrate the manufacturing method through whichthe image sensor in the first embodiment is manufactured;

FIGS. 12A and 12B illustrate the manufacturing method through which theimage sensor in the first embodiment is manufactured;

FIGS. 13A and 13B illustrate the manufacturing method through which theimage sensor in the first embodiment is manufactured;

FIG. 14 shows focus detection areas assumed on the image-capturing planeset on the predetermined image forming plane of the exchangeable lens ina second embodiment;

FIG. 15 shows the color filter Bayer array adopted in the secondembodiment;

FIG. 16 shows in detail the image sensor achieved in the secondembodiment;

FIGS. 17A and 17B show the structure adopted for the image-capturingpixels in the second embodiment;

FIGS. 18A and 18B show the structure adopted for the focus detectionpixels in the second embodiment;

FIG. 19 presents a diagram in reference to which the split-pupil focusdetection method adopted in the second embodiment is described;

FIG. 20 shows the basic pixel structure assumed in the image sensor inthe second embodiment;

FIG. 21 illustrates wirings included in each pixel in the secondembodiment;

FIGS. 22A and 22B show the wirings laid out in the wiring layer in thesecond embodiment;

FIGS. 23A through 23C illustrate the manufacturing method through whichthe image sensor in the second embodiment is manufactured;

FIGS. 24A through 24C illustrate the manufacturing method through whichthe image sensor in the second embodiment is manufactured; and

FIGS. 25A and 25B illustrate the manufacturing method through which theimage sensor in the second embodiment Is manufactured.

DESCRIPTION OF PREFERRED EMBODIMENTS First Embodiment

The first embodiment, achieved by adopting the present invention in anelectronic camera to function as an image-capturing device, is nowdescribed. FIG. 1 shows the structure adopted in the electronic cameraachieved in the first embodiment. The electronic camera 101 in the firstembodiment comprises an exchangeable lens 102 and a camera body 103. Theexchangeable lens 102 is mounted on a mount unit 104 at the camera body103.

The exchangeable lens 102 includes lenses 105 through 107, an aperture108 and a lens drive control device 109. It is to be noted that the lens106 is a zooming lens and that the lens 107 is a focusing lens. The lensdrive control device 109, constituted with a CPU and its peripheralcomponents, controls the drive of the focusing lens 107 and the aperture108. It also detects the positions of the zooming lens 106, the focusinglens 107 and the aperture 108, and transmits lens information andreceives camera information by communicating with a control device inthe camera body 103.

An image sensor 111, a camera drive control device 112, a memory card113, an LCD driver 114, an LCD 115, an eyepiece lens 116 and the likeare disposed at the camera body 103. The image sensor 111, set at thepredetermined image forming plane (predetermined focal plane) of theexchangeable lens 102, captures a subject image formed through theexchangeable lens 102 and outputs image signals. At the image sensor111, pixels used for image-capturing (hereafter simply referred to asimage-capturing pixels) are disposed in a two-dimensional pattern, androws of pixels used for focus detection (hereafter simply referred to asfocus detection pixels), instead of image-capturing pixels, are disposedin the two-dimensional array over areas corresponding to focus detectionpositions.

The camera drive control device 112, constituted with a CPU and itsperipheral components, controls the drive of the image sensor 111,processes the captured image, executes focus detection and focusadjustment for the exchangeable lens 102, controls the aperture 108,controls the display operation at the LCD 115, communicates with thelens drive control device 109 and controls the overall operationalsequence in the camera. It is to be noted that the camera drive controldevice 112 communicates with the lens drive control device 109 via anelectrical contact point 117 at the mount unit 104.

The memory card 113 is an image storage device in which captured imagesare stored. The LCD 115 is used as a display unit of a liquid crystalviewfinder (EVF: electronic viewfinder). The photographer is able tovisually check a captured image displayed at the LCD 115 via theeyepiece lens 116.

The subject image formed on the image sensor 111 after passing throughthe exchangeable lens 102 undergoes photoelectric conversion at theimage sensor 111 and the image output is provided to the camera drivecontrol device 112. The camera drive control device 112 determinesthrough arithmetic operation the defocus quantity indicating the extentof defocusing manifesting at a focus detection position based upon theoutputs from the focus detection pixels and transmits the defocusquantity to the lens drive control device 109. In addition, the cameradrive control device 112 provides image signals generated based upon theoutputs from the image-capturing pixels to the LCD driver 114 so as todisplay the captured image at the LCD 115, and also stores the imagesignals into the memory card 113.

The lens drive control device 109 detects the positions of the zoominglens 106, the focusing lens 107 and the aperture 108 and obtains througharithmetic operation the lens information based upon the detectedpositions. As an alternative, the lens information corresponding to thedetected positions may be selected from a lookup table prepared inadvance. The lens information is then provided to the camera drivecontrol device 112. In addition, the lens drive control device 109calculates a lens drive quantity indicating the extent to which the lensis to be driven based upon the defocus quantity received from the cameradrive control device 112, and controls the drive of the focusing lens107 based upon the lens drive quantity.

The image sensor 111 is a backside illumination 4TR-CMOS (complementarymetal oxide semiconductor) sensor. The 4TR-CMOS sensor assumes afour-transistor structure which, together with a photoelectricconversion unit, includes a transfer gate transistor, a source followertransistor, a row selector transistor and a reset transistor. A detaileddescription is to be provided later.

FIG. 2 shows focus detection areas on an image-capturing plane G set onthe predetermined image forming plane of the exchangeable lens 102.Focus detection areas G1 through G5 are set on the image-capturing planeG and focus detection pixels are disposed in a linear formation alongthe longer side of each of the focus detection areas G1 through G5 seton the image-capturing plane G. Namely, focus detection pixel rows onthe image sensor 111 sample the image portions in the focus detectionareas G1 through G5 within the subject image formed on the photographicimage plane G. The photographer manually selects a specific focusdetection area among the focus detection areas G1 through G5 incorrespondence to the desired photographic composition.

FIG. 3 shows the positional arrangement adopted for color filtersdisposed at the image sensor 111. Color filters in a Bayer array in FIG.3 are each disposed at one of the image-capturing pixels arrayed in thetwo-dimensional pattern on the substrate of the image sensor 111. It isto be noted that while FIG. 3 shows the color filter positionalarrangement corresponding to a four-pixel (2×2) image-capturing area,this image-capturing pixel unit adopting the color filter positionalarrangement over the four-pixel area, as shown in the figure, istwo-dimensionally reiterated. In the Bayer array, two pixels with G(green) filters disposed thereat are set at diagonal positions with thepair of remaining pixels, one with a B (blue) filter disposed thereatand the other with an R (red) filter disposed thereat, set at diagonalpositions perpendicular to the G filter pixels. Thus, green pixels aredisposed with higher density compared to red pixels and blue pixels inthe Bayer array.

FIG. 4 is a front view showing in detail the structure of the imagesensor 111. It is to be noted that FIG. 4 shows the vicinity of a givenfocus detection area on the image sensor 111 in an enlargement. Theimage sensor 111 includes image-capturing pixels 210 and focus detectionpixels 211 engaged in focus detection.

FIG. 5A shows image-capturing pixels 210 in a front view. FIG. 5B is asectional view taken along A-A in FIG. 5A. The image-capturing pixels210 are each constituted with a micro lens 10, a micro lens fixing layer11, a color filter 12, a planarizing layer 13, a semiconductor layer 16and a wiring layer 17. A photoelectric conversion unit 15 a and achannel stop portion 15 b are formed at one surface of the semiconductorlayer 16.

Via the micro lens 10, light, having reached the surface of theimage-capturing pixel 210 is condensed and directed onto thephotoelectric conversion unit 15 a. The micro lens 10 is attached ontothe color filter 12 via the micro lens fixing layer 11. The color filter12 is a resin layer through which light in a predetermined wavelengthrange is transmitted. The planarizing layer 13 is formed following theremoval of a support substrate 60 through a manufacturing step to bedetailed later (see FIG. 12A) so as to planarize the surface beforeforming the color filter 12.

The light having reached the photoelectric conversion unit 15 aundergoes photoelectric conversion and the resulting signal charge isstored at the photoelectric conversion unit. The channel stop portion 15b, formed at the boundary between two image-capturing pixels 210,prevents entry of the signal charge generated at the photoelectricconversion unit 15 a into a neighboring pixel. Wirings such as a signaloutput line, a power source line, a reset control line, a transfer gatecontrol line and a row selection control line to be detailed later arepresent in the wiring layer 17. The wirings are to be described indetail later.

FIG. 6A shows focus detection pixels 211 in a front view. FIG. 6B is asectional view taken along B-B in FIG. 6A. The focus detection pixels211 are each constituted with a micro lens 10, a micro lens fixing layer11, a light shielding film 18, a planarizing layer 13, a semiconductorlayer 16 and a wiring layer 17. A photoelectric conversion unit 15 a anda channel stop portion 15 b are formed at one surface of thesemiconductor layer 16. Since the micro lens 10, the micro lens fixinglayer 11, the planarizing layer 13, the photoelectric conversion unit 15a, the channel stop portion 15 b and the wiring layer 17 at the focusdetection pixel fulfill functions similar to those at theimage-capturing pixels 210, a repeated explanation is not provided.

The light shielding film 18 includes an opening ranging over the righthalf or the left half of the photoelectric conversion unit 15 a in FIG.6B, so as to allow incoming light to enter the right half or the lefthalf of the photoelectric conversion unit. A focus detection pixel 211 aat which light enters the right half of the photoelectric conversionunit 15 a and a focus detection pixel 211 b at which light enters theleft half of the photoelectric conversion unit 15 a are disposedalternately to each other in a reiterating pattern. The defocus quantityindicating the extent of defocusing is calculated by comparing theoutput distribution corresponding to the focus detection pixels 211 awith the output distribution corresponding to the focus detection pixels211 b.

Next, the focus detection method adopted in the embodiment is describedin reference to FIG. 7. The focus is detected through the split-pupilmethod in this embodiment of the present invention. FIG. 7 is a diagramof distributions of the outputs from the focus detection pixels 211,which may be observed when the exchangeable lens 102 fails to achieve afocusing state. A curve 21 represents the output distributioncorresponding to the focus detection pixels 211 a. A curve 22 representsthe output distribution corresponding to the focus detection pixels 211b. The focus detection pixels 211 are each disposed alternately to afocus detection pixel 211 b. The diagram, with the curve 21 offset tothe right relative to the curve 22, indicates the position of the focusdetection pixels 211 is in a rear focus state.

By multiplying the image shift quantity indicated by the two outputdistribution curves 21 and 22 by a predetermined conversion coefficient,the extent of deviation (defocus quantity) of the current image formingplane (the image forming plane at the focus detection position relativeto the position of the micro lenses 10 on the predetermined imageforming plane) relative to the predetermined image forming plane can becalculated. The curve 21 and the curve 22 will be in alignment with eachother when the exchangeable lens 102 achieves the focusing state.

In reference to FIG. 8, the basic pixel structure assumed at the imagesensor 111 is described. As explained earlier, the image sensor 111 is abackside illumination 4TR-CMOS sensor and its basic pixel 300 isconstituted with a photoelectric conversion unit 33, a charge/voltageconversion unit 34 and four transistors, i.e., a transfer gatetransistor 32, a source follower transistor 35, a row selectortransistor 36 and a reset transistor 31. In addition, a signal outputline V_(out), a source line Vdd, a reset control line ØR, a transfergate control line ØTG and a row selection control line ØRS are connectedto the basic pixel 300.

The reset transistor 31 resets the potential at the charge/voltageconversion unit 34 to the initial potential. The transfer gatetransistor 32 transfers the signal charge resulting from thephotoelectric conversion to the charge/voltage conversion unit 34. Thelight having reached the photoelectric conversion unit 33 undergoesphotoelectric conversion and the resulting signal charge is stored atthe photoelectric conversion unit as explained earlier. Thecharge/voltage conversion unit 34 assumes a floating capacitance withwhich the signal charge is converted to a potential, and the floatingcapacitance is generated by a diode that functions as a capacitor. Thesource follower transistor 35 amplifies the change in the potential atthe charge/voltage conversion unit 34, which is attributable to thestored charge. The row selector transistor 36 is engaged in switchingoperation in order to select a specific basic pixel 300 for signaltransfer.

The signal output line V_(out), via which the signal output from thebasic pixel 300 is transferred, is connected to the drain of the rowselector transistor 36. The source line Vdd, via which power to be usedin the amplification of the potential change at the charge/voltageconversion unit 34 is supplied, is connected to the source of the resettransistor 31. The reset control line ØR, via which the ON/OFF state ofthe reset transistor 31 is controlled, is connected to the gate of thereset transistor 31. The transfer gate control line ØTG is a wiring viawhich the signal charge transfer to the charge/voltage conversion unit34 is controlled and is connected to the gate of the transfer gatetransistor 32. The row selection control line ØRS, via which the ON/OFFstate of the row selector transistor 36 is controlled, is connected tothe gate of the row selector transistor 36.

In reference to FIG. 9, the wirings included in a single pixel aredescribed. At the image sensor 111 shown in FIG. 9, two signal outputlines V_(out), two source lines Vdd, two reset control lines ØR, twotransfer gate control lines ØTG and two row selection control line ØRSare installed in each row of pixels disposed in a side-by-sidearrangement, and four signal output lines V_(out) are installed incorrespondence to each column of pixels. This structure allows thesignals from a plurality of basic pixels 300 to be read out at once,which, in turn, improves the detection speed of the image sensor 111.Thus, the wirings in a given pixel 51 indicated by the dotted lines inFIG. 9 include wirings to connect with a specific basic pixel 300 aswell as wirings connecting with other basic pixels 300 instead of theparticular basic pixel 300. Thus, numerous wirings are included in eachpixel.

In reference to FIGS. 10A and 10B, wirings present in the wiring layer17 at the image sensor 111 are described. FIG. 10A is a plan view of thewirings in the wiring layer 17, seen from the side where the micro lens10 is present. FIG. 10B is a sectional view taken along C-C in FIG. 10A.As shown in FIGS. 10A and 10B, wirings are formed in a grid pattern overthree strata within the wiring layer. In the first stratum viewed fromthe side where the photoelectric conversion unit 15 a is present, foursignal output lines V_(out), and two bias lines Vb are formed, whereastwo source lines Vdd and two reset control lines ØR are formed in thesecond stratum. In the third stratum, two transfer gate control linesØTG and two row selection control lines ØRS are formed. The bias linesVb are formed to prevent crosstalk.

As shown in FIG. 10B, the wirings can be formed in the wiring layer 17free of any positional restrictions attributable to the presence of thephotoelectric conversion unit 15 a, since the wiring layer 17 is formedon the side opposite from the light entry side of the photoelectricconversion unit 15 a. In other words, the structure in the embodimentallows wirings to be also formed in an area that will overlap theprojected image of the light receiving area of the photoelectricconversion unit 15 a, projected from the light receiving surface side atthe image sensor 111. In contrast, a wiring layer at a front-sideillumination image sensor must be formed on the light entry side of thephotoelectric conversion unit 15 a, requiring wirings to be formedwithout interfering with the light receiving area at the photoelectricconversion unit.

In addition, since the wiring layer 17 at the image sensor 111 in theembodiment is not subjected to any positional restrictions attributableto the presence of the photoelectric conversion unit 15 a, the linewidth of the wirings can be increased to improve the signal transmissionefficiency.

Next, in reference to FIGS. 11A through 13B, a method is described thatmay be adopted when manufacturing the image sensor 111 in the embodimentof the present invention. FIGS. 11A through 13B each illustrate aspecific area of the image sensor 111 where focus detection pixels 211are to be formed.

As shown in FIG. 11A, a P-type epitaxial layer 61 is formed over asemiconductor substrate 60, and photoelectric conversion units 15 a,channel stop portions 15 b and other elements (not shown) to constitutetransistors and the like are formed by forming a diffusion layer at thesurface of the P-type epitaxial layer 61. The P-type epitaxial layer 61is equivalent to the semiconductor layer 16. Next, as shown in FIG. 11B,silicon oxide film formation through CVD and Al wiring formation throughsputtering are executed multiple times, thereby forming the wiring layer17 above the P-type epitaxial layer 61. Then, a support substrate 62 isbonded onto the wiring layer 17, as shown in FIG. 11C.

The semiconductor substrate 60 is removed through etching as shown inFIG. 12A. Next, as shown in FIG. 12B, a resin to constitute theplanarizing layer 13 is evenly applied over the surface from which thesemiconductor substrate 60 has been removed, so as to planarize thesurface from which the semiconductor substrate 60 has been removed, andthen a process of resin coating, drying the resin having been applied,pattern exposure and developing is executed multiple times so as to formthe light shielding film 18 and color filters (not shown). The lightshielding film 18 may be formed by dispersing black pigment such astitanium black or carbon black in the resin or by coloring the resinwith a black dye. Color filters (not shown) may be formed by dispersingpigments corresponding to various colors (e.g., R, G and B) over theresin or by coloring the resin with dyes corresponding to the variouscolors (e.g., R, G and B).

As shown in FIG. 13A, after a resin to constitute the micro lens fixinglayer 11 is applied over the light shielding film 18 and the colorfilters (not shown), a resin to constitute the micro lenses 10 isapplied and then patterned through a lithography process of the knownart so as to form micro lens bases 63. Next, as shown in FIG. 13B, microlenses 10 are formed by hot-forming the micro lens bases 63 into asemi-spherical shape on a hot plate or the like. The process formanufacturing the image sensor 111 is completed when the supportsubstrate 62 is removed.

It is to be noted that while the micro lenses 10, the color filters 12and the light shielding film 18 are essential components of the imagesensor, it is not crucial that the image sensor include the micro lensfixing layer 11 or the planarizing layer 13.

The following advantages are achieved through the embodiment describedabove.

(1) The image-capturing pixels 210 and the focus detection pixels 211each include the semiconductor layer 16 with a photoelectric conversionunit 15 a formed at one surface thereof and the other surface thereofused as a light receiving surface and the wiring layer 17 with a wiringthrough which the signal from the photoelectric conversion unit 15 a isread out present therein. The wiring layer 17 at the image-capturingpixels 210 and the wiring layer 17 at the focus detection pixel 211 areeach formed on the surface of the respective semiconductor layer 16.Each image-capturing pixel 210 includes a color filter 12 through whichlight in a predetermined wavelength range is transmitted, formed at theother surface of the semiconductor layer 16, whereas each focusdetection pixel 211 includes a light shielding film 18, via which partof the incoming light is blocked, is formed at the other surface of thesemiconductor layer 16. Thus, no wirings through which signals from thephotoelectric conversion units are to be read out are required betweenthe micro lenses 10 and the photoelectric conversion units 15 a and thelight shielding film 18 and the color filters 12 do not overlap eachother either. Consequently, the distance (depth) between the microlenses 10 and the photoelectric conversion units 15 a can be reduced,thereby assuring improved focus detection accuracy.

(2) The light shielding film 18 is constituted of a material prepared bydispersing black pigment such as titanium black or carbon black througha resin or by coloring a resin with black dye. As a result, the extentof reflection of the incoming light at the light shielding film 18 isminimized.

(3) The light shielding film 18 is constituted of a material prepared bydispersing black pigment such as titanium black or carbon black througha resin or by coloring a resin with black dye and the color filters 12are constituted of a material prepared by dispersing pigmentscorresponding to specific colors (e.g., R, G and B) through a resin orby coloring the resin with dyes corresponding to the specific color(e.g., R, G and B). Since both the light shielding film and the colorfilters are constituted of resin, the light shielding film 18 can beformed through a process similar to the process for forming the colorfilters 12, thereby affording a high level of convenience. For instance,the light shielding film 18 can be formed through a process similar tothe process for forming the color filter 12, through repeated executionof a process of resin coating, drying the resin, pattern exposure anddeveloping processing. In addition, since the thickness of the lightshielding film 18 manufactured through a process similar to the processfor forming the color filters 12 can be controlled with ease, adjustmentof the input characteristics is enabled. Furthermore, since the lightshielding film 18 for blocking part of the incoming light is present inthe layer corresponding to the layer at which the color filters 12 ofthe image-capturing pixels 210 are present, the light shielding film 18can be formed during the process of forming the color filters 12,thereby affording further convenience.

(4) The image sensor 111 is manufactured by forming a P-type epitaxiallayer 61 at the surface of a semiconductor substrate 60, formingphotoelectric conversion units 15 a at the surface of the P-typeepitaxial layer 61, forming a wiring layer 17 over the photoelectricconversion units 15 a, removing the semiconductor substrate 60 from theP-type epitaxial layer 61, forming a light shielding film 18 and colorfilters 12 on the surface of the P-type epitaxial layer 61 from whichthe semiconductor substrate 60 has been removed and forming micro lenses10 above the light shielding film 18 and above the color filters 12.Since the light shielding film 18 and the color filters 12 are formedthrough a single process, the image sensor 111 can be manufactured witha high level of efficiency.

(5) Each focus detecting pixel 211 includes a wiring via which a signal,not from its photoelectric conversion unit 15 a but from thephotoelectric conversion unit of another pixel is read out, installed onthe side where one surface of the semiconductor layer 16 is present.Since this structure allows wirings to be formed so as to allow signalsat a plurality of basic pixels 300 to be read out at once, the detectionspeed of the image sensor 111 is improved.

(6) The wirings are installed by ensuring that they overlap theprojected images of the light receiving areas of the photoelectricconversion units 15 a, projected from the side where the light receivingsurface of the image sensor 111 is present. As a result, the number ofwirings formed at each focus detection pixel 211 can be increased or thewidth of the wirings formed at the focus detection pixel can beincreased without significantly increasing the number of wiringinstallation strata. In the case of a front-side illumination imagesensor, which requires wirings to be formed by ensuring that they do notoverlap the light receiving areas of the photoelectric conversion units,an attempt at forming a greater number of wirings may result in anincrease in the number of wiring strata or in a limited width that canbe assumed for the wirings.

The embodiment described above allows for the following variations.

(1) The thickness of the light shielding film 18 may be different fromthe thickness of the color filters 12. Since the thickness of the lightshielding film can be set differently from that of the color filters,the focus position can be adjusted as desired for the focus detectionpixels 211.

(2) The position of the light shielding film 18 may be offset along thethickness of the image sensor 111 relative to the position of the colorfilters 12. By offsetting the position of the light shielding film to aspecific extent, focus position adjustment for the focus detectionpixels 211 is enabled.

(3) While the wiring layer 17 in the embodiment described above includesthree wiring strata, the number of wiring strata in the wiring layer 17is not limited to three. For instance, the wiring layer 17 may includeup to 10 wiring strata, so as to increase the number of pixels, thesignals from which are read out simultaneously, or to increase thenumber of pixels to be controlled simultaneously. The image sensoraccording to the present invention differs from a front-sideillumination image sensor in that an increase in the wiring strata doesnot result in an increase in the distance between the micro lenses 10and the photoelectric conversion units 15 a. As an alternative, thenumber of wiring strata in the wiring layer 17 may be reduced to two inorder to provide an image sensor with more limited functions and lowerproduction costs.

(4) The light shielding film 18 may be constituted of a materialprepared by dispersing pigments corresponding to all the colors, R, Gand B assumed for the color filters 12 through the resin or by coloringthe resin with dyes corresponding to all the colors, R, G and B assumedfor the color filters. As an alternative, the light shielding film 18may be formed by layering an R color filter, a G color filter and a Bcolor filter one on top of another.

(5) While the image sensor 111 described above is a 4TR-CMOS sensor, thepresent invention may be adopted in conjunction with a backsideillumination image sensor other than a 4TR-CMOS sensor. For instance, itmay be adopted in conjunction with another CMOS sensor or in conjunctionwith a CCD (charge coupled device) sensor.

(6) While the light shielding film 18 in the embodiment fulfills a lightshielding function only, the light shielding film 18 may also fulfill afunction as an electrode or as wiring in addition to the light shieldingfunction. For instance, the light shielding film 18 may be formed byusing a dark colored, electrically conductive material so as to fulfillboth the light shielding function and a conducting function (anelectrode function or a wiring function). Such a light shielding film 18with multiple functions may be constituted of a material prepared by,for instance, dissolving carbon black into an electrically conductiveorganic material (an electrically conductive high polymer material or anelectrically conductive polymer material). It is to be noted that insuch a case, control lines can be installed as the light shielding film18 with better convenience by disposing focus detection pixels so as toallow them to occupy a whole row at the image sensor rather thandisposing focus detection pixels over only part of a row within theimage sensor, as shown in FIG. 4.

By structuring the image sensor as described above, a furtherimprovement in its functions can be achieved. For instance, signals maybe read out from the pixels with higher speed or individual pixels maybe controlled independently of one another. An additional functionassumed at the light shielding film 18 may be, for instance, one of thefollowing; the function as a signal line (a signal output line V_(out)),the function as a source line Vdd, the function as a control line (areset control line ØR, a transfer gate control line ØTG or a rowselection control and ØRS) and the function as a bias line Vb. With sucha light shielding film fulfilling an additional function, it becomespossible to install a greater number of wirings to read out signals froma plurality of pixels at once or to control a plurality of pixelssimultaneously, without having to increase the number of wiring stratain the wiring layer 17.

In addition, by allowing the light shielding film 18 to assume anelectrode function or a wiring function, the signal lines, the controllines, the source lines and the bias lines can be isolated from oneanother with greater freedom. Certain lines among the signal lines, thecontrol lines, the source lines and the bias lines should be formed awayfrom other electrodes or wirings. By assuming the function of such awiring at the light shielding film 18 and forming other wirings in thewiring layer 17, the wirings can be set apart from one another. Forinstance, crosstalk may occur when a signal line is formed near acontrol line. Accordingly, the function of either the signal line or thecontrol line may be fulfilled via the light shielding film 18 and theother wiring may be formed in the wiring layer 17, so as to set thesignal line away from the control line.

In such a case, a through hole passing through the P-type epitaxiallayer 61 and the planarizing layer 13 may be formed through etching orthe like and a wiring for electrically connecting the light shieldingfilm 18 with a photoelectric conversion unit 15 a or another elementformed at the surface of the P-type epitaxial layer 61 may be formed byusing this through hole.

Furthermore, by forming the color filters 12 and the light shieldingfilm 18 with electrically conductive material, the entire layer at whichthe color filters 12 and the light shielding film 18 are present can beutilized as a functional layer functioning as a wiring or an electrodeto assure a further improvement in the functions that the image sensorprovides.

The first embodiment described above may be adopted in conjunction withany one of the variations or in conjunction with a plurality ofvariations. The variations described above may also be adopted in anyconceivable combination.

Second Embodiment

The second embodiment achieved by adopting the present invention in anelectronic camera functioning as an image-capturing device is described.The electronic camera achieved in the second embodiment adopts astructure similar to that of the electronic camera in the firstembodiment and accordingly, a repeated explanation is not provided. Itis to be noted that the same reference numerals are assigned tostructural elements similar to those in the first embodiment. Thefollowing explanation focuses on the image sensor achieved in the secondembodiment.

As is the image sensor in the first embodiment, the image sensor 111achieved in the second embodiment is a backside illumination 4TR-CMOS(complementary metal oxide semiconductor) sensor. The 4TR-CMOS sensorassumes a four-transistor structure which, together with a photoelectricconversion unit, includes a transfer gate transistor, a source followertransistor, a row selector transistor and a reset transistor. A detaileddescription is to be provided later.

FIG. 14 shows focus detection areas on an image-capturing plane G set onthe predetermined image forming plane of the exchangeable lens 102. FIG.14 is similar to FIG. 2 in reference to which the first embodiment hasbeen described. Focus detection areas G1 through G5 are set on theimage-capturing plane G and focus detection pixels are disposed in alinear formation along the longer side of each of the focus detectionareas G1 through G5 set on the image-capturing plane G. Namely, focusdetection pixel rows on the image sensor 111 sample the image portionsin the focus detection areas G1 through G5 within the subject imageformed on the photographic image plane G. The photographer manuallyselects a specific focus detection area among the focus detection areasG1 through G5 in correspondence to the desired photographic composition.

FIG. 15 shows the positional arrangement adopted for color filtersdisposed at the image sensor 111. FIG. 15 is similar to FIG. 3 inreference to which the first embodiment has been described. Colorfilters in the Bayer array in FIG. 15 are each disposed at one of theimage-capturing pixels arrayed in a two-dimensional pattern on thesubstrate of the image sensor 111. It is to be noted that while FIG. 15shows the color filter positional arrangement corresponding to afour-pixel (2×2) image-capturing area, this image-capturing pixel unitadopting the color filter positional arrangement over the four-pixelarea, as shown in the figure, is two-dimensionally reiterated. In theBayer array, two pixels with G (green) filters disposed thereat are setat diagonal positions with the pair of remaining pixels, one with a B(blue) filter disposed thereat and the other with an R (red) filterdisposed thereat, set at diagonal positions perpendicular to the Gfilter pixels. Thus, green pixels are disposed with higher densitycompared to red pixels and the pixels in the Bayer array.

FIG. 16 is a front view showing in detail the structure of the imagesensor 111. It is to be noted that FIG. 16 shows the vicinity of a givenfocus detection area on the image sensor 111 in an enlargement. Theimage sensor 111 includes image-capturing pixels 210 and focus detectionpixels 211 engaged in focus detection.

FIG. 17A shows image-capturing pixels 210 in a front view. FIG. 17B is asectional view taken along A-A in FIG. 17A. The image-capturing pixels210 are each constituted with a micro lens 10, a micro lens fixing layer11, a color filter 12, a planarizing layer 13, a light shielding film14A, a semiconductor layer 16 and a wiring layer 17. A photoelectricconversion unit 15 a and a channel stop portion 15 b are formed at onesurface of the semiconductor layer 16.

Via the micro lens 10, light, having reached the surface of theimage-capturing pixel 210 is condensed and directed onto thephotoelectric conversion unit 15 a. The micro lens 10 is attached ontothe color filter 12 via the micro lens fixing layer 11. The color filter12 is a resin layer through which light in a predetermined wavelengthrange is transmitted, and is formed by, for instance, dispersing pigmentcorresponding to a specific color (e.g., R, G or B) through the resin orby coloring the resin with a dye corresponding to a specific color(e.g., R, G or B). The planarizing layer 13 is formed after forming thelight shielding film 14 through a manufacturing step to be detailedlater (see FIG. 24B), so as to planarize the surface before forming thecolor filter 12.

With the light shielding film 14A, which shields the vicinity of thechannel stop 15 b from light, the occurrence of noise or color bleedingis prevented. Light having reached the photoelectric conversion unit 15a undergoes photoelectric conversion and the resulting signal charge isstored at the photoelectric conversion unit. The channel stop portion 15b formed at the boundary between two image-capturing pixels 210,prevents entry of the signal charge generated at the photoelectricconversion unit 15 a into a neighboring pixel. Wirings such as a signaloutput line, a source line, a reset control line, a transfer gatecontrol line and a row selection control line to be detailed later arepresent in the wiring layer 17. The wirings are to be described indetail later.

FIG. 18A shows focus detection pixels 211 in a front view. FIG. 18B is asectional view taken along B-B in FIG. 18A. The focus detection pixels211 are each constituted with a micro lens 10, a micro lens fixing layer11, a transparent film 19, a planarizing layer 13, a light shieldingfilm 14B, a semiconductor layer 16 and a wiring layer 17. Aphotoelectric conversion unit 15 a and a channel stop portion 15 b areformed at one surface of the semiconductor layer 16. Since the microlens 10, the micro lens fixing layer 11, the planarizing layer 13, thephotoelectric conversion unit 15 a, the channel stop portion 15 b andthe wiring layer 17 at the focus detection pixel fulfill functionssimilar to those at the image-capturing pixels 210, a repeatedexplanation is not provided.

The light shielding film 14B includes an opening ranging over the righthalf or the left half of the photoelectric conversion unit 15 a in FIG.18B, so as to allow incoming light to enter the right half or the lefthalf of the photoelectric conversion unit. A focus detection pixel 211 aat which light enters the right half of the photoelectric conversionunit 15 a and a focus detection pixel 211 b at which light enters theleft half of the photoelectric conversion unit 15 b are disposedalternately to each other in a reiterating pattern. The defocus quantityindicating the extent of defocusing is calculated by comparing theoutput distribution corresponding to the focus detection pixels 211 awith the output distribution corresponding to the focus detection pixels211 b. The transparent film 19 is a resin layer through which light overthe full visible light wavelength range is transmitted.

Next, the focus detection method adopted in the embodiment is describedin reference to FIG. 19. The focusing condition is detected through thesplit-pupil method in this embodiment of the present invention. FIG. 19is a diagram of distributions of the outputs from the focus detectionpixels 211, which may be observed when the exchangeable lens 102 failsto achieve a focusing state. A curve 21 represents the outputdistribution corresponding to the focus detection pixels 211 a. A curve22 represents the output distribution corresponding to the focusdetection pixels 211 b. The focus detection pixels 211 a are eachdisposed alternately to a focus detection pixel 211 b. The diagram, withthe curve 21 offset to the right relative to the curve 22, indicates theposition of the focus detection pixels 211 is in a rear focus state.

By multiplying the image shift quantity indicated by the two outputdistribution curves 21 and 2 by a predetermined conversion coefficient,the extent of deviation (defocus quantity) of the current image formingplane (the image forming plane at the focus detection position relativeto the position of the micro lenses 10 on the predetermined imageforming plane) relative to the predetermined image forming plane can becalculated. The curve 21 and the curve 22 will be in alignment with eachother when the exchangeable lens 102 achieves the focusing state.

In reference to FIG. 20, the basic pixel structure assumed at the imagesensor 111 is described. FIG. 20 is similar to FIG. 8 in reference towhich the first embodiment has been described. As explained earlier, theimage sensor 111 is a backside illumination 4TR-CMOS sensor and itsbasic pixel 300 is constituted with a photoelectric conversion unit 33,a charge/voltage conversion unit 34 and four transistors, i.e., atransfer gate transistor 32, a source follower transistor 35, a rowselector transistor 36 and a reset transistor 31. In addition, a signaloutput line V_(out), a source line Vdd, a reset control line ØR, atransfer gate control line ØTG and a row selection control line ØRS areconnected to the basic pixel 300.

The reset transistor 31 resets the potential at the charge/voltageconversion unit 34 to the initial potential. The transfer gatetransistor 32 transfers the signal charge resulting from thephotoelectric conversion to the charge/voltage conversion unit 34. Thelight having reached the photoelectric conversion unit 33 undergoesphotoelectric conversion and the resulting signal charge is stored atthe photographic conversion unit as explained earlier. Thecharge/voltage conversion unit 34 assumes a floating capacitance withwhich the signal charge is converted to a potential, and the floatingcapacitance is generated by a diode that functions as a capacitor. Thesource follower transistor 35 amplifies the change in the potential atthe charge/voltage conversion unit 34, which is attributable to thestored charge. The row selector transistor 36 is engaged in switchingoperation in order to select a specific basic pixel 300 for signaltransfer.

The signal output line V_(out), via which the signal output from thebasic pixel 300 is transferred, is connected to the drain of the rowselector transistor 36. The source line Vdd, via which power to be usedin the amplification of the potential change at the charge/voltageconversion unit 34 is supplied, is connected to the source of the resettransistor 31. The reset control line ØR, via which the ON/OFF state ofthe reset transistor 31 is controlled, is connected to the gate of thereset transistor 31. The transfer gate control line ØTG is a wiring viawhich the signal charge transfer to the charge/voltage conversion unit34 is controlled, and is connected to the gate of the transfer gatetransistor 32. The row selection control line ØRS, via which the ON/OFFstate of the row selector switch 36 is controlled, is connected to thegate of the row selector transistor 36.

In reference to FIG. 21, the wirings included in a single pixel aredescribed. FIG. 21 is similar to FIG. 9 in reference to which the firstembodiment has been described. At the image sensor 111 shown in FIG. 21,two signal output lines V_(out), two source lines Vdd, two reset controllines ØR, two transfer gate control lines ØTG and two row selectioncontrol line ØRS are installed in each row of pixels disposed in aside-by-side arrangement, and four signal output lines V_(out) areinstalled in correspondence to each column of pixels. This structureallows the signals from a plurality of basic pixels 300 to be read outat once, which, in turn, improves the detection speed of the imagesensor 111. Thus, the wirings in a pixel 51, indicated by the dottedlines in FIG. 21 include wirings connecting with a specific basic pixel300 as well as wirings connecting with other basic pixels 300 instead ofthe particular basic pixel 300. Thus, numerous wirings are included ineach pixel.

In reference to FIGS. 22A and 22B, wirings present in the wiring layer17 at the image sensor 111 are described. FIG. 22A is a plan view of thewirings in the wiring layer 17, taken from the side where the micro lens10 is present. FIG. 22B is a sectional view taken along C-C in FIG. 22A.As shown in FIGS. 22A and 22B, wirings are formed in a grid pattern overthree strata within the wiring layer. In the first stratum viewed fromthe side where the photoelectric conversion unit 15 a is present, foursignal output lines V_(out), and two bias lines Vb are formed, whereastwo source lines Vdd and two reset control lines ØR are formed in thesecond stratum. In the third stratum, two transfer gate control linesØTG and two row selection control lines ØRS are formed. The bias linesVb are formed to prevent crosstalk.

As shown in FIG. 22B, the wirings can be formed in the wiring layer 17,free of any positional restrictions attributable to the presence of thephotoelectric conversion unit 15 a, since the wiring layer 17 is formedon the side opposite from the light entry side of the photoelectricconversion unit 15 a. In other words, the structure in the embodimentallows wirings to also be formed in an area that will overlap theprojected image of the light receiving area of the photoelectricconversion unit 15 a, projected from the light receiving surface side atthe image sensor 111. In contrast, a wiring layer at a front-sideillumination image sensor must be formed on the light entry side of thephotoelectric conversion unit 15 a, requiring wirings to be formedwithout interfering with the light receiving area at the photoelectricconversion unit.

In addition, since the wiring layer 17 at the image sensor 111 in theembodiment is not subjected to any positional restrictions attributableto the presence of the photoelectric conversion unit 15 a, the linewidth of the wirings can be increased to improve the signal transmissionefficiency.

Next, a method that may be adopted when manufacturing the image sensor111 in the embodiment of the present invention is described in referenceto FIGS. 23A through 25B. FIGS. 23A through 25B each illustrate aspecific area of the image sensor 111 where focus detection pixels 211are to be formed.

As shown in FIG. 23A, a P-type epitaxial layer 61 is formed over asemiconductor substrate 60, and photoelectric conversion units 15 a,channel stop portions 15 b and other elements (not shown) to constitutetransistors and the like are formed by forming a diffusion layer at thesurface of the P-type epitaxial layer 61. The P-type epitaxial layer 61is equivalent to the semiconductor layer 16. Next, as shown in FIG. 23B,silicon oxide film formation through CVD and aluminum (Al) wiringformation through sputtering are executed repeatedly, thereby formingthe wiring layer 17 above the P-type epitaxial layer 61. Then, a supportsubstrate 62 is bonded onto the wiring layer 17, as shown in FIG. 23C.

The semiconductor substrate 60 is then removed through etching as shownin FIG. 24A. Next, as shown in FIG. 24B, the light shielding film 14B,constituted of aluminum (Al), is formed through sputtering on thesurface from which the semiconductor substrate 60 has been removed.Then, as shown in FIG. 24C, a resin to constitute the planarizing layer13 is evenly applied over the light shielding film 14B so as toplanarize the surface, before the transparent film 19 is formed. Thetransparent film 19 may be formed through a process of resin coating,drying the resin having been applied, pattern exposure and developing.

As shown in FIG. 25A, after a resin to constitute the micro lens fixinglayer 11 is applied over the transparent film 19, a resin to constitutethe micro lenses 10 is applied and then patterned through a lithographyprocess of the known art so as to form micro lens bases 63. Next, asshown in FIG. 25B, micro lenses 10 are formed by hot-forming the microlens bases 63 into a semi-spherical shape on a hot plate or the like.The process for manufacturing the image sensor 111 is completed when thesupport substrate 62 is removed.

Over an area where image-capturing pixels 210 are present, color filters12, instead of the transparent film 19, are formed and the lightshielding film 14A, instead of the light shielding film 14B, is formed.The color filters 12 and the transparent film 19 are formed through acommon process, whereas the light shielding film 14A and the lightshielding film 14B are formed through a common process.

It is to be noted that while the micro lenses 10, the color filters 12and the transparent film 19 are essential components of the imagesensor, it is not crucial that the image sensor include the micro lensfixing layer 11 or the planarizing layer 13.

The following advantages are achieved through the second embodimentdescribed above.

(1) The image sensor 111 is a backside illumination image sensorequipped with a plurality of pixels disposed in a two-dimensionalpattern, which includes focus detection pixels 211 and image-capturingpixels 210. Since this structure allows the substantial opening area atthe light shielding film 14B at the focus detection pixels 211 to be setto a large value, an image sensor equipped with focus detection pixelscan be provided even if the pixels are further miniaturized.

In addition, since the wiring layer is formed on the side opposite fromthe light entry side of the photoelectric conversion units 15 a, thedistance between the micro lenses 10 and the photoelectric conversionunits 15 a is reduced at least by the extent corresponding to thethickness of the wiring layer, compared to the corresponding distance ata front-side illumination image sensor with the wiring layer formed onthe light entry side of the photoelectric conversion units 15 a, andthus, better focus detection accuracy is assured.

(2) The focus detection pixels 211 each include the semiconductor layer60 with the photoelectric conversion unit 15 a formed at one surfacethereof and the other surface thereof used as the light receivingsurface, the light shielding film 14B, which blocks part of the light toenter the photoelectric conversion unit 15 a, and a wiring V_(out),through which the signal output from the photoelectric conversion unit15 a is read out. The wiring V_(out) is formed on the side where the onesurface of the semiconductor layer 60 is present, whereas the lightshielding film 14B is formed on the side where the other surface of thesemiconductor layer 16 is present. Since this structure reduces thedistance (depth) between the micro lens 10 and the photoelectricconversion unit 15 a, compared to the corresponding distance at afront-side illumination image sensor requiring a wiring via which thesignal from the photoelectric conversion unit is read out, to be formedbetween the micro lens and the photoelectric conversion unit, betterfocus detection accuracy is assured.

(3) Each focus detecting pixel 211 includes a wiring via which thesignal, not from its photoelectric conversion unit 15 a but from thephotoelectric conversion unit of another pixel, is read out, installedon the side where one surface of the semiconductor layer 16 is present.Since this structure allows wirings to be formed so as to allow signalsat a plurality of basic pixels 300 to be read out at once, the detectionspeed of the image sensor 111 is improved.

(4) The wirings are installed by ensuring that they overlap theprojected images of the light receiving areas of the photoelectricconversion units 15 a, projected from the side where the light receivingsurface of the image sensor 111 is present. As a result, the number ofwirings formed at each focus detection pixel 211 can be increased or thewidth of the wirings formed at the focus detection pixel can beincreased without significantly increasing the number of wiringinstallation strata. In the case of a front-side illumination imagesensor, which requires wirings to be formed by ensuring that they do notoverlap the light receiving areas of the photoelectric conversion units,an attempt at forming a greater number of wirings may result in anincrease in the number of wiring strata or in a limited width that canbe assumed for the wirings.

(5) Since a higher degree of freedom is afforded with regard to theshapes that the light shielding films 14A and 14B may assume, the pixelseparation performance for the image-capturing pixels can be improved orthe occurrence of the line-crawl phenomenon attributable to crosstalk orlight leakage among pixels can be prevented effectively by selecting theoptimal shapes for the light shielding films 14A and 14B.

(6) The image sensor 111 is manufactured by forming a P-type epitaxiallayer 61 at the surface of a semiconductor substrate 60, formedphotoelectric conversion units 15 a at the surface of the P-typeepitaxial layer 61, forming a wiring layer 17 over the photoelectricconversion units 15 a, removing the semiconductor substrate 60 from theP-type epitaxial layer 61, forming light shielding films 14A and 14B onthe surface of the P-type epitaxial layer 61 from which thesemiconductor substrate 60 has been removed, forming a transparent film19 and color filters 12 over the light shielding films 14A and 14B andforming micro lenses 10 over the transparent film 19 and the colorfilters 12. Through this process, the backside illumination image sensorcan be manufactured with a high level of efficiency.

The second embodiment described above allows for the followingvariations.

(1) The light shielding films 14A and 14B may each assume an electrodefunction or a wiring function. An image sensor with such light-shieldingfilms will provide improved functions. For instance, signals may be readout from the pixels with higher speed or individual pixels may becontrolled independently of one another. An additional function assumedat the light shielding film 14A or 14B may be, for instance, one of thefollowing; the function as a signal line (signal output line V_(out),the function as a source line Vdd, the function as a control line (areset control line ØR, a transfer gate control line ØTG or a rowselection control and ØRS and the function as a bias line Vb. With sucha light shielding film fulfilling an additional function, it becomespossible to install a greater number of wirings to read out signals froma plurality of pixels at once or to control a plurality of pixelssimultaneously, without having to increase the number of wiring stratain the wiring layer 17.

In addition, by allowing the light shielding films 14A and 14B to assumean electrode function or a wiring function, the signal lines, thecontrol lines, the source lines and the bias blinds can be isolated fromone another with greater freedom. Certain lines among the signal lines,the control lines, the source lines and the bias lines should be formedaway from other electrodes or wirings. By assuming the function of sucha wiring at the light shielding film 14A or 14B and forming otherwirings in the wiring layer 17, the wirings can be set apart from oneanother. For instance, crosstalk may occur when a signal line is formednear a control line. Accordingly, the function of either the signal lineor the control line may be assumed at the light shielding film 14A or14B and the other wiring may be formed in the wiring layer 17 so as toset the signal line away from the control line.

In such a case, a through hole passing through the P-type epitaxiallayer 61 may be formed through etching or the like and a wiring forelectrically connecting the light shielding film 14A or 14B with aphotoelectric conversion unit 15 a or another element formed at thesurface of the P-type epitaxial layer 61 may be formed by using thisthrough hole.

(2) While the wiring layer 17 in the embodiment described above includesthree wiring strata, the number of wiring strata in the wiring layer 17is not limited to three. For instance, the wiring layer 17 may includeup to 10 wiring strata, so as to increase the number of pixels, thesignals from which are read out simultaneously or to increase the numberof pixels to be controlled simultaneously. The image sensor according tothe present invention differs from a front-side illumination imagesensor in that an increase in the wiring strata does not result in anincrease in the distance between the micro lenses 10 and thephotoelectric conversion units 15 a. As an alternative, the number ofwiring strata in the wiring layer 17 may be reduced to two in order toprovide an image sensor with more limited functions at lower cost.

(3) The light shielding films 14A and 14B may assume a floating state,or a voltage may be applied to the light shielding films 14A and 14B byapplying a bias to the light shielding films 14A and 14B or by fixingthe light shielding films 14A and 14B to the source. Through thesemeasures, the load capacity can be adjusted or crosstalk can beeffectively prevented.

(4) While the light shielding films 14A and 14B are constituted ofaluminum (Al), i.e., a material assuring high reflectance, they mayinstead be constituted of a metal having a reflectance equal to or lessthan a predetermined level lower than the reflectance of aluminum (Al).For instance, tungsten (W), titanium (Ti) or tin (Sn) may be used toform the light shielding films 14A and 14B. With the light shieldingfilms 14A and 14B constituted with any of these materials, the extent towhich the quality of the image photographed with the electronic camera101 is adversely affected by light reflected off the light shieldingfilms 14A and 14B and entering the photoelectric conversion units 15 a,can be reduced. In addition, instead of tungsten (W), titanium (Ti) ortin (Sn), a metal with a reflectance equal to or lower than the visiblelight reflectance of tungsten (W), a metal with a reflectance equal toor lower than the visible light reflectance of titanium (Ti) or a metalwith a reflectance equal to or lower than the visible light reflectanceof tin (Sn), may be used.

As an alternative, the light shielding films 14A and 14B may be formedby using an oxide or a nitride that does not allow light to betransmitted through at a reflectance equal to or less than apredetermined value lower than the reflectance of aluminum (Al). Forinstance, an oxide or a nitride that does not allow visible light to betransmitted through, assuming a reflectance equal to or less than thevisible light reflectance of tungsten (W), equal to or less than thevisible light reflectance of titanium (Ti) or equal to or less than thevisible light reflectance of tin (Sn) may be used to form the lightshielding films. Oxides that may be used for these purposes include, forinstance, tungsten oxide, titanium oxide and tin oxide, whereas nitridesthat may be used for the same purposes include, for instance, tungstennitride, titanium nitride and tin nitride. The light shielding films 14Aand 14B are formed through CVD or sputtering after the semiconductorsubstrate 60 is removed (see FIG. 24A).

(5) While the light shielding films 14A and 14B are constituted ofaluminum (Al), i.e., a material assuring high reflectance, a resin thatdoes not allow light to be transmitted through at a reflectance equal toor less than a predetermined level lower than the reflectance ofaluminum (Al) may be used when forming the light shielding films. Forinstance, a photo-curing resin containing black pigment such as titaniumblack or carbon black or a photo-curing resin colored with black dye maybe used to form the light shielding films 14A and 14B. With the lightshielding films 14A and 14B constituted of such a material, entry oflight reflected off the light-shielding films 14A and 14B into thephotoelectric conversion units 15 a can be prevented. As a furtheralternative, a resin that does not allow visible light to be transmittedthrough, assuming a reflectance equal to or less than the visible lightreflectance of tungsten (W), equal to or less than the visible lightreflectance of titanium (Ti) or equal to or less than the visible lightreflectance of tin (Sn) may be used instead of a photo-curing resincontaining black pigment such as titanium black or carbon black or aphoto-curing resin colored with black dye. Such light shielding films14A and 14B may be formed through a process of resin coating, drying theresin having been applied, pattern exposure and developing processing,executed after removing the semiconductor substrate 60 (see FIG. 24A).

(6) A film constituted of a metal with a reflectance equal to or lessthan a predetermined level lower than the reflectance of aluminum (Al)may be formed over the surfaces of the light shielding films 14A and14B. For instance, a film constituted of tungsten (W), titanium (Ti) ortin (Sn) may be formed over the surfaces of the light shielding films14A and 14B. With such a film formed over the surfaces of the lightshielding films, entry of light reflected off the light shielding films14A and 14B into the photoelectric conversion units 15 a is effectivelyprevented. In addition, instead of tungsten W), titanium (Ti) or tin(Sn), a metal with a reflectance equal to or less than the visible lightreflectance of tungsten (W), equal to or less than the visible lightreflectance of titanium (Ti) or equal to or less than the visible lightreflectance of tin (Sn) may be used when forming a film over thesurfaces of the light shielding films 14A and 14B.

As an alternative, a film constituted of an oxide or a nitride that doesnot allow light to be transmitted through at a reflectance equal to orless than a predetermined level lower than the reflectance of aluminum(Al) may be formed over the surfaces of the light shielding films 14Aand 14B. For instance, a film constituted of an oxide or a nitride thatdoes not allow visible light to be transmitted through, assuming areflectance equal to or less than the visible light reflectance oftungsten (W), equal to or less than the visible light reflectance oftitanium (Ti) or equal to or less than the visible light reflectance oftin (Sn), may be formed over the surfaces of the light shielding films14A and 14B. Oxides that may be used for these purposes include, forinstance, tungsten oxide, titanium oxide and tin oxide, whereas nitridesthat may be used for the same purposes include, for instance, tungstennitride, titanium nitride and tin nitride. Such a film may be formedthrough CVD or sputtering after the light shielding films 14A and 14Bare formed (see FIG. 24B).

(7) A film constituted of a resin that does not allow light to betransmitted at a reflectance equal to or less than a predetermined levellower than the reflectance of aluminum (Al) may be formed over thesurfaces of the light shielding films 14A and 14B. For instance, a filmconstituted of a photo-curing resin containing black pigment such astitanium black or carbon black or a photo-curing resin colored withblack dye may be formed over the surfaces of the light shielding films14A and 14B. With such a film, entry of light reflected off the lightshielding films 14A and 14B into the photoelectric conversion units 15 acan be prevented effectively. As an alternative, a film constituted of aresin that does not allow visible light to be transmitted through,assuming a reflectance equal to or less than the visible lightreflectance of tungsten (W), equal to or less than the visible lightreflectance of titanium (Ti) or equal to or less than the visible lightreflectance of tin (Sn) may be formed over the surfaces of the lightshielding films 14A and 14B instead of a film constituted of aphoto-curing resin containing black pigment such as titanium black orcarbon black or a photo-curing resin colored with black dye. Such a filmmay be formed through a process of resin coating, drying the resinhaving been applied, pattern exposure and developing processing,executed after forming the light shielding films 14A and 14B (see FIG.24B).

(8) A film constituted of a material with a reflectance thereof equal toor less than the predetermined level described above may be formed overthe surfaces of the light shielding films 14A and 14B constituted of amaterial with a reflectance equal to or less than the predeterminedlevel described above. Through these measures, the entry of lightreflected off the light shielding films 14A and 14B into thephotoelectric conversion units 15 a can be suppressed even moreeffectively.

(9) While the image sensor 111 described above is a 4TR-CMOS sensor, thepresent invention may be adopted in conjunction with a backsideillumination image sensor other than a 4TR-CMOS sensor. For instance, itmay be adopted in conjunction with another type of CMOS sensor or inconjunction with a CCD (charge coupled device) sensor.

The second embodiment described above may be adopted in conjunction withany one of the variations or in conjunction with a plurality ofvariations. The variations described above may also be adopted in anyconceivable combination.

It is to be noted that the operations and advantages described inreference to the first embodiment are also achieved through the secondembodiment and that the operations and advantages described in referenceto the second embodiment are also achieved through the first embodiment.In addition, some of the variations of the first embodiment may also beachieved in conjunction with the second embodiment, whereas some of thevariations of the second embodiment may also be achieved in conjunctionwith the first embodiment.

The above described embodiments are examples, and various modificationscan be made without departing from the scope of the invention.

What is claimed is:
 1. An image sensor comprising: a first microlensupon which light is incident; a second microlens upon which light isincident; a first member having a first opening through which light istransmitted from the first microlens; a second member having a secondopening through which light is transmitted from the second microlens, anopening area of the second opening being smaller than an opening area ofthe first opening; a first photoelectric converter that converts lightfrom the first opening to an electric charge; a second photoelectricconverter that converts light from the second opening to an electriccharge; a first charge/voltage converter to which the electric chargefrom the first photoelectric converter is transferred; a secondcharge/voltage converter to which the electric charge from the secondphotoelectric converter is transferred; a first reset portion forresetting a potential at the first charge/voltage converter; a secondreset portion for resetting a potential at the second charge/voltageconverter; a first reset control line that is connected to the firstreset portion, and to which is output a control signal for controllingthe first reset portion; and a second reset control line that isconnected to the second reset portion, and to which is output a controlsignal for controlling the second reset portion, wherein: the firstphotoelectric converter is disposed between the first microlens and thesecond reset control line in an optical axis direction of the firstmicrolens; and the second photoelectric converter is disposed betweenthe second microlens and the first reset control line in an optical axisdirection of the second microlens.
 2. The image sensor according toclaim 1, wherein: the second photoelectric converter is disposed at aposition on a row direction side from the first photoelectric converter.3. The image sensor according to claim 2, further comprising: a firstsource follower transistor that is connected to the first charge/voltageconverter and outputs a first signal based upon a potential at the firstcharge/voltage converter; and a second source follower transistor thatis connected to the second charge/voltage converter and outputs a secondsignal based upon a potential at the second charge/voltage converter. 4.The image sensor according to claim 3, further comprising: a firstoutput line to which the first signal is output; and a second outputline to which the second signal is output.
 5. The image sensor accordingto claim 4, wherein: the first photoelectric converter is disposedbetween the first microlens and the first output line in the opticalaxis direction of the first microlens; and the second photoelectricconverter is disposed between the second microlens and the second outputline in the optical axis direction of the second microlens.
 6. The imagesensor according to claim 5, wherein: the first output line is disposedbetween the first photoelectric converter and the second reset controlline in the optical axis direction of the first microlens; and thesecond output line is disposed between the second photoelectricconverter and the first reset control line in the optical axis directionof the second microlens.
 7. The image sensor according to claim 6,further comprising: a first select portion for connecting the firstsource follower transistor and the first output line; and a secondselect portion for connecting the second source follower transistor andthe second output line.
 8. The image sensor according to claim 7,further comprising: a first select control line connected to the firstselect portion, a control signal for controlling the first selectportion being output; and a second select control line connected to thesecond select portion, a control signal for controlling the secondselect portion being output, wherein: the first photoelectric converteris disposed between the first microlens and the second select controlline in the optical axis direction of the first microlens; and thesecond photoelectric converter is disposed between the second microlensand the first select control line in the optical axis direction of thesecond microlens.
 9. The image sensor according to claim 8, wherein: thefirst reset control line is disposed between the first photoelectricconverter and the second select control line in the optical axisdirection of the first microlens, and the second reset control line isdisposed between the second photoelectric converter and the first selectcontrol line in the optical axis direction of the second microlens. 10.The image sensor according to claim 1, further comprising: a firstsource follower transistor that is connected to the first charge/voltageconverter and outputs a first signal based upon a potential at the firstcharge/voltage converter; and a second source follower transistor thatis connected to the second charge/voltage converter and outputs a secondsignal based upon a potential at the second charge/voltage converter.11. The image sensor according to claim 10, further comprising: a firstoutput line to which the first signal is output; and a second outputline to which the second signal is output.
 12. The image sensoraccording to claim 11, wherein: the first photoelectric converter isdisposed between the first microlens and the first output line in theoptical axis direction of the first microlens; and the secondphotoelectric converter is disposed between the second microlens and thesecond output line in the optical axis direction of the secondmicrolens.
 13. The image sensor according to claim 12, wherein: thefirst output line is disposed between the first photoelectric converterand the second reset control line in the optical axis direction of thefirst microlens; and the second output line is disposed between thesecond photoelectric converter and the first reset control line in theoptical axis direction of the second microlens.
 14. The image sensoraccording to claim 13, wherein: the second photoelectric converter isdisposed at a position on a row direction side from the firstphotoelectric converter.
 15. The image sensor according to claim 1,further comprising: a first source follower transistor that is connectedto the first charge/voltage converter and outputs a first signal basedupon a potential at the first charge/voltage converter; a second sourcefollower transistor that is connected to the second charge/voltageconverter and outputs a second signal based upon a potential at thesecond charge/voltage converter; a first output line to which the firstsignal is output; a second output line to which the second signal isoutput; a first select portion for connecting the first source followertransistor and the first output line; a second select portion forconnecting the second source follower transistor and the second outputline; a first select control line connected to the first select portion,and to which is output a control signal for controlling the first selectportion; and a second select control line connected to the second selectportion, and to which is output a control signal for controlling thesecond select portion, wherein: the first photoelectric converter isdisposed between the first microlens and the second select control linein the optical axis direction of the first microlens; and the secondphotoelectric converter is disposed between the second microlens and thefirst select control line in the optical axis direction of the secondmicrolens.
 16. The image sensor according to claim 15, wherein: thefirst reset control line is disposed between the first photoelectricconverter and the second select control line in the optical axisdirection of the first microlens; and the second reset control line isdisposed between the second photoelectric converter and the first selectcontrol line in the optical axis direction of the second microlens. 17.The image sensor according to claim 16, wherein: the secondphotoelectric converter is disposed at a position on a row directionside from the first photoelectric converter.
 18. An image capturingdevice comprising: the image sensor according to claim
 1. 19. An imagecapturing device comprising: the image sensor according to claim
 13. 20.An image capturing device comprising: the image sensor according toclaim 16.